The present invention relates to a method for manufacturing a transparent electrode structure for a touchscreen using electron beam evaporation. More specifically, a transparent electrode structure for a touchscreen is obtained by sequentially stacking, on a substrate, TiO2 having a thickness of 35 to 55 Å, SiO2 having a thickness of 450 to 475 Å, TiO2 having a thickness of 125 to 145 Å, SiO2 having a thickness of 275 to 300 Å, and ITO having a thickness of 240 to 260Å respectively in electron beam evaporation. In particular, a transparent electrode is manufactured by specifying deposition speed, partial pressure of oxygen of a sub ion gun used in the deposition, a chamber temperature, maintenance of an oxygen and vacuum level in the chamber, and pre-heating conditions before ITO deposition to form transmittance of the transparent electrode so as to be closest to that of glass or a polymer film that is a basic member in the manufacture of a panel, thereby improving transparency so as not to be identified with the naked eye after forming the pattern of the transparent electrode. In addition, an extinction coefficient of indium tin oxide (ITO) of short wave band (450nm) can be controlled to suppress yellowing of ITO, thereby solving the problems such as deterioration of transmittance of a display′s light source and color variation thereof after assembly with the light source. Further, a transparent electrode maximizing transparency can be manufactured, thereby improving visibility of a final panel product by the improved transparency of the transparent electrode.;COPYRIGHT KIPO 2014
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