首页> 外国专利> Field effect transistor having localized halo ion region, and semiconductor memory, memory card, and system including the same

Field effect transistor having localized halo ion region, and semiconductor memory, memory card, and system including the same

机译:具有局部卤素离子区域的场效应晶体管,半导体存储器,存储卡以及包括该晶体管的系统

摘要

The present invention optimizes the hot- electron organic punch-through characteristics , gate -drain leakage characteristics and performance of organic transistors, providing a field effect transistor comprising a localized region that can be a halo ion . Field effect transistor according to an embodiment of the present invention , the substrate , the active region including a channel region and source / drain region formed on a portion in the substrate , the gate structure which contacts the active region and electrically , and in the substrate the source / drain regions adjacent the opposite ends of the haloalkyl comprises a localized ion region comprising the halo region formed by localized ion .
机译:本发明优化了有机电子晶体管的热电子有机穿通特性,栅极-漏极泄漏特性和性能,从而提供了包括局部区域的场效应晶体管,该局部区域可以是卤离子。根据本发明实施例的场效应晶体管,衬底,有源区域包括形成在衬底中的一部分上的沟道区和源/漏区,栅结构与有源区域电接触,并且在衬底中与卤代烷基的相对末端相邻的源/漏区包括一个局部离子区,该局部离子区包括由局部离子形成的卤代区。

著录项

  • 公开/公告号KR101416316B1

    专利类型

  • 公开/公告日2014-07-08

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20070129056

  • 发明设计人 정혁채;임준희;

    申请日2007-12-12

  • 分类号H01L29/78;H01L21/336;

  • 国家 KR

  • 入库时间 2022-08-21 15:40:33

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