Thin film of variable emittance material on metal layer and method for fabrication of the same

摘要

The present invention comprises: a) a lanthanum precursor, the strontium precursor , mixed with a solvent to form a manganese precursor sol solution steps to ; b) wherein a) the heating and stirring of the gelation phase mixture formed in step ; c) coating the mixture gelled on the surface of the metal substrate; And d) a step of calcining the metal substrate including the above coating layer, relates to a structure comprising a variable emissivity material thin film to be produced by the production method and this structure comprising a variable emissivity material thin film containing the br. / ;