Overview optic apparatus of microscope for investigating lithography mask used in semiconductor manufacturing, has imaging optic units into which lighting radiation is irradiated for illuminating associated object field

摘要

The overview optic apparatus (40) comprises two imaging optic units that are spaced from each other, for reproducing two object fields into an object plane. The image fields are arranged for overlapping in a picture plane. A lighting radiation is irradiated into each of the imaging optic units for illuminating the associated object field. An independent claim is included for microscope.