首页> 外国专利> A method for engrave of images by means of radiation in a radiation-sensitive layer, in particular for laser engraving

A method for engrave of images by means of radiation in a radiation-sensitive layer, in particular for laser engraving

机译:一种在辐射敏感层中通过辐射雕刻图像的方法,特别是用于激光雕刻的方法

摘要

The invention relates to a method for engrave of images by means of radiation in a radiation-sensitive layer, in particular laser engraving, in which the layer is irradiated at points, so that, for a pixel (pi, k) a blackening (sis(Pi, k)) a is achieved, which for this image point (pi, k) predetermined gray level corresponds to. In order in a single engraving passage high quality images to be able to engrave, it is provided that for the image point (pi, k) the achieved blackening (sis(Pi, k)) is determined, the difference (δsi, k) between the determined blackening (sis(Pi, k)) and a predetermined blackening (sshould(Pi, k)) is calculated, and the difference (δsi, k) on at least two still to be irradiated, of adjacent pixels (pi, k + n; Pi + n, k + m) is distributed.
机译:用于在辐射敏感层中进行辐射雕刻图像的方法技术领域本发明涉及一种通过在辐射敏感层中进行辐射雕刻图像的方法,尤其是激光雕刻,其中该层在点处被辐射,从而对于像素(p i,k < / Sub>)实现变黑(s is (P i,k ))a,对于该图像点(p i,k >)预定的灰度级对应。为了能够在单个雕刻通道中雕刻高质量的图像,规定对于图像点(p i,k )实现的变黑(s is 确定(P i,k )),确定的变黑(s is (P i,k ))和预定的黑化(s 应该(P i,k )),然后计算出差值(δs i ,k )在至少两个仍要照射的相邻像素(p i,k + n ; P i + n,k + m )上分布。

著录项

  • 公开/公告号DE102012015382A1

    专利类型

  • 公开/公告日2014-02-06

    原文格式PDF

  • 申请/专利权人 BUNDESDRUCKEREI GMBH;

    申请/专利号DE20121015382

  • 发明设计人 THOMAS KRAMER;

    申请日2012-08-02

  • 分类号H04N1/40;B44F1/12;B23K26/36;B42D15/10;

  • 国家 DE

  • 入库时间 2022-08-21 15:37:55

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