Method for manufacturing e.g. thin layer sensor used in elongation measurement device, involves annealing defects of insulation layer by applying voltage between substrate and work structure so that defects in work structure is removed

摘要

The method involves electrically contacting a component blank (18) of a metallic substrate (12). An insulating layer (14) is applied on metallic substrate and electrically conductive work structure (16). Defects (21-1,21-2) of the insulation layer are annealed by applying an electrical voltage between the substrate and work structure so that the defects accommodated in work structure is removed from voids. Independent claims are included for the following: (1) an electronic component; and (2) an electronic component.