Illumination optical unit for projection exposure system, has pupil facet mirror that is provided such that number of pupil facets in inner group is set different from number of pupil facets in outer group

摘要

The optical unit has a pupil facet mirror (10) provided with primary pupil facets whose inner group connected with an illumination tilt position of a field facet is arranged in an inner region around a center of a carrier of the pupil facet mirror. An outer group of secondary pupil facets associated with other illumination tilt position of the field facet is arranged in an outer region surrounding the inner region. The number of primary pupil facets in the inner group is set different from the number of secondary pupil facets in outer group. Independent claims are included for the following: (1) an optical system; (2) a projection exposure system; and (3) a method for manufacturing structured components of optical system.