metal-peroxo-compounds with organic coligands for electron beam, and deep-uv- extremely uv resist-applications

摘要

There are the compositions according to the formula (3): [C.'']_k[Ta (o₂)_x(L'')_y] (3),wherein x is an integer of 1 to 4, y is an integer of 1 to 4, ta (o₂)_x(L'')_y a charge of 0 to – 3, c is a counterion with a charge of + 1 to + 3, k is an integer of 0 to 3, l ''a oxidatively stable organic ligand with a charge of 0 to – 4, and l is'' has an electron-donating functional group, which is selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides and combinations thereof. The compositions are used as highly resolving photoresists application.