Metal - - peroxo compounds with organic coligands for electron beam -, deep - uv - and extremely - uv - photo paint applications

摘要

Photoresist composition, comprising:Water;from 0.1 percent by weight to 30% by weight hydrogen peroxide; andfrom 1% by weight to 30% by weight of a peroxocomplex with a structure according to formula (1): $[C.\text{'}\text{'}]$_k[M''_w(O₂)_x(L'')_yO_u] (1),whereinw is equal to 1 or 2,x is an integer of 1 to 4 is,y is an integer of 1 to 4 is,u is equal to 0 or 1,M''_w(O₂)_x(L'')_yO_u a charge of 0 to 3 – has,C ''ammonium (nh4⁺) is,k is a whole number from 0 to 3 is,M ''is a metal ion, which is selected from the group consisting of tantalum (v), niobium (v), titanium (iv), and combinations thereof,L ''a oxidatively stable organic carboxylate - ligand, wherein weight percentage on the basis of a solid - total weight of the photoresist composition is based.