首页> 外国专利> VAPOR DEPOSITION MASK, PRODUCTION METHOD OF VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREFORM, VAPOR DEPOSITION MASK WITH FRAME, AND PRODUCTION METHOD OF ORGANIC SEMICONDUCTOR DEVICE

VAPOR DEPOSITION MASK, PRODUCTION METHOD OF VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREFORM, VAPOR DEPOSITION MASK WITH FRAME, AND PRODUCTION METHOD OF ORGANIC SEMICONDUCTOR DEVICE

机译:气相沉积面膜,气相沉积面膜的制备方法,气相沉积面膜预成型件,具有框架的气相沉积面膜以及有机半导体器件的制备方法

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition mask and a vapor deposition mask with a frame, which satisfies both high definition and weight saving even with a large sized mask, and by which a high definition vapor deposition pattern is formed with strength maintained, and to provide a production method of the vapor deposition mask and a vapor deposition mask preform by which the vapor deposition mask is easily produced, and a production method of an organic semiconductor device by which an organic semiconductor device with high precision is produced.SOLUTION: The vapor deposition mask simultaneously forms vapor deposition patterns for a plurality of screens. Metal masks 10 with a plurality of slits 15 are laminated in one face of a resin mask 20 in the vapor mask 100. An opening 25 required for constituting the plurality of screens is provided in the resin mask, and the opening corresponds to a vapor deposition made pattern. Each slit is provided at a position overlapping with at least a whole one screen, and a metal layer 40 thinner than the metal mask in thickness is provided in either one face or both of an area corresponding to a position overlapping with the slit on one face of the resin mask, and the other face of the resin mask.
机译:解决的问题:为了提供即使具有大尺寸的掩模也能够兼顾高画质和轻量化的具有框架的蒸镀掩模和具有框架的蒸镀掩模,并且能够形成高强度的蒸镀图案并保持强度,并提供易于制造气相沉积掩模的气相沉积掩模和气相沉积掩模预成型体的生产方法,以及能够生产具有高精度的有机半导体器件的有机半导体器件的生产方法。气相沉积掩模同时形成用于多个屏幕的气相沉积图案。在蒸气掩模100的树脂掩模20的一个面上层叠有具有多个狭缝15的金属掩模10。在树脂掩模上设有构成多个画面所需的开口25,该开口相当于蒸镀。制成的图案。每个狭缝设置在至少与整个一个屏幕重叠的位置,并且在与一个表面上与狭缝重叠的位置相对应的区域的一个表面或两个区域中的一个或两个区域中设置厚度比金属掩模薄的金属层40。树脂掩模的另一面。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号