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Vapor deposition mask, vapor deposition mask preparation body, vapor deposition mask production method, pattern production method, vapor deposition mask with frame, and organic semiconductor element production method

机译:气相沉积掩模,气相沉积掩模制备体,气相沉积掩模生产方法,图案生产方法,具有框架的气相沉积掩模和有机半导体元件的生产方法

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition mask and a vapor deposition mask preparation body which satisfy both high-definition and weight saving even if their sizes become large, and can improve yield in a manufacturing process using the vapor deposition mask and improve quality, and a manufacturing method of an organic semiconductor device using the vapor deposition mask.SOLUTION: In a vapor deposition mask 100 in which a metal mask 10 provided with a slit 15 overlapping an opening part 25 is laminated on one surface of a resin mask 20 in which an opening 25 corresponding to a pattern produced by vapor deposition is provided, the above problem is solved by exposing at least a part of a surface on a side where the metal mask 100 contacts the resin mask 20 of the metal mask 10.
机译:解决的问题:提供即使尺寸变大也能够兼顾高精细化和轻量化的蒸镀掩模和蒸镀掩模制备体,并且能够在使用该蒸镀掩模的制造工艺中提高成品率并提高品质。解决方案:在气相沉积掩模100中,其中在树脂掩模20的一个表面上层压具有与开口部分25重叠的狭缝15的金属掩模10的金属掩模10。在其中设置有与通过气相沉积产生的图案相对应的开口25的情况下,通过暴露金属掩模100与金属掩模10的树脂掩模20接触的一侧的表面的至少一部分来解决上述问题。

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