首页> 外国专利> VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK HAVING FRAME, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENCE DISPLAY

VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK HAVING FRAME, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENCE DISPLAY

机译:气相沉积面膜,具有框架的气相沉积面膜,气相沉积面膜制备体,图案形成方法,气相沉积面膜的制造方法,有机半导体元件的制造方法以及有机电子发光的制造方法

摘要

To provide a vapor deposition mask capable of forming a high definition vapor deposition pattern.SOLUTION: A vapor deposition mask simultaneously forming a vapor deposition pattern having the plurality of screens includes a resin mask 20 having openings 25 required in order to form a plurality of screens. When an assembly of openings required to form one screen in the openings 25 required to form the plurality of screens included in the resin mask 20 is used as a first assembly and an assembly of openings adjacent to the first assembly and required to form the other screen is used as a second assembly, metal layers 10 extended on the second assembly side from the first assembly is provided between the first assembly and the second assembly on one surface of the resin mask.SELECTED DRAWING: Figure 1
机译:为了提供能够形成高清晰度的气相沉积图案的气相沉积掩模。解决方案:同时形成具有多个屏幕的气相沉积图案的气相沉积掩模包括树脂掩模20,该树脂掩模20具有为了形成多个屏幕而需要的开口25。 。当在形成树脂掩模20中包括的形成多个筛网所需的开口25中形成一个筛网所需的开口的组件用作第一组件并且与第一组件相邻并需要形成另一个筛网的开口的组件用作第一组件时。作为第二组件,在第一组件和第二组件之间的树脂掩膜的一个表面上提供了从第一组件延伸到第二组件一侧的金属层10。

著录项

  • 公开/公告号JP2019108584A

    专利类型

  • 公开/公告日2019-07-04

    原文格式PDF

  • 申请/专利权人 DAINIPPON PRINTING CO LTD;

    申请/专利号JP2017242039

  • 申请日2017-12-18

  • 分类号C23C14/04;C23C16/04;H05B33/10;H01L51/50;H01L27/32;G09F9/30;G09F9;

  • 国家 JP

  • 入库时间 2022-08-21 12:23:29

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