MICROWAVE HEATING TREATMENT APPARATUS AND MICROWAVE HEATING TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To uniformly perform heating treatment in a substrate surface in heating treatment for heating a substrate to be treated by introducing a microwave into a treatment container.;SOLUTION: A microwave heating treatment apparatus for heating a wafer in a treatment container by irradiating the wafer with a microwave includes: a substrate holding mechanism for holding and rotating the wafer in the treatment container; a microwave generation source for generating a microwave; a waveguide 12 for introducing the microwave generated from the microwave generation source into the treatment container; and a microwave irradiation mechanism 14 coupled to a treatment container side end part of the waveguide to change directivity of the microwave applied to the inside of the treatment container.;COPYRIGHT: (C)2015,JPO&INPIT