Target and its manufacturing method for sputtering the oxide sintered body as well as the forming method and thin film formation method of a thin film using the target

摘要

PROBLEM TO BE SOLVED: To provide a GTO sputtering target that can control the generation of a nodule and a particle even at continuous sputtering, and can obtain a film with high uniformity of a membrane property, and especially to provide a sputtering target for an FPD.SOLUTION: The oxide sintered compact target for sputtering includes: 1-20 mol% of GaO; and the balance SnOand inevitable impurities, and the oxide sintered compact target for sputtering is characterized in that the relative density is at least 97%, and the bulk resistivity is at most 1,000 cm in the phase observed in the structure of the oxide sintered compact target.