首页> 外国专利> TEMPORARY ADHESIVE MATERIAL FOR WAFER, TEMPORARY ADHESIVE FILM USING THE SAME, AND WAFER PROCESSED ARTICLE, AND METHOD FOR MANUFACTURING THIN WAFER USING THE SAME

TEMPORARY ADHESIVE MATERIAL FOR WAFER, TEMPORARY ADHESIVE FILM USING THE SAME, AND WAFER PROCESSED ARTICLE, AND METHOD FOR MANUFACTURING THIN WAFER USING THE SAME

机译:晶圆的临时粘合剂材料,使用相同的临时粘合剂膜以及晶圆加工的物品,以及使用相同的晶圆制造薄晶圆的方法

摘要

PROBLEM TO BE SOLVED: To provide a temporary adhesive material which facilitates temporary adhesion of a wafer to a support member and also enables formation of a temporary adhesive layer having high uniformity in thickness on a substrate with a difference in surface height, has high process adaptability to TSV formation and wafer underside wiring, facilitates peeling off a thin wafer from the support member and improves productivity, and a temporary adhesive film and a method for manufacturing thin wafer using them.SOLUTION: The inventive temporary adhesive layer enables formation of a temporary adhesive layer even on a wafer having a difference in surface height, and because of the uniformity in thickness, allows a uniform thin wafer having a thickness of 50 m or less to be obtained easily. Further, since it enables stress-free peeling off of a thin wafer from a support member after formation thereof with a little amount of exposure, fragile thin wafers can be easily handled without causing damage thereto, facilitating manufacture of a thin wafer.
机译:解决的问题:提供一种临时粘合材料,该临时粘合材料有利于晶片与支撑构件的临时粘合,并且还能够在表面高度不同的基板上形成厚度均匀性高的临时粘合层,并且具有较高的工艺适应性。 TSV形成和晶片下侧布线,有利于从支撑构件上剥离薄晶片并提高生产率,以及临时粘合膜和使用它们的制造薄晶片的方法。即使在表面高度不同的晶片上形成一层薄的晶片,并且由于厚度均匀,也可以容易地获得厚度为50m或更小的均匀薄晶片。另外,由于能够以很少的暴露量将薄晶片从支撑部件上无应力地剥离,因此能够容易地处理易碎的薄晶片而不会造成损伤,从而易于制造薄晶片。

著录项

  • 公开/公告号JP2014241399A

    专利类型

  • 公开/公告日2014-12-25

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP20140086148

  • 发明设计人 YASUDA HIROYUKI;SUGAO MICHIHIRO;

    申请日2014-04-18

  • 分类号H01L21/304;C09J7;C09J11/06;C09J183/04;

  • 国家 JP

  • 入库时间 2022-08-21 15:30:10

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