Method for manufacturing a semiconductor device on a substrate, method for fragmentation or mask data preparation for charged particle beam lithography, method and system for forming a plurality of circular patterns on a surface, and charged particle beam System for fragmentation or mask data preparation for use in lithography

摘要

PURPOSE: A method for manufacturing a semiconductor device and a method for forming and fracturing circular patterns on a surface are provided to form various sizes of circular patterns on a photo-mask by changing a charged particle beam dosage. CONSTITUTION: A photo-mask(204) is manufactured using a charged particle beam system. The photo-mask includes a circular pattern(210). A plurality of circular patterns is formed on the upper side of a substrate using the circular pattern of the photo-mask. The circular patterns on the substrate include patterns for contact or via. An illumination source(202) emits the optical radiation onto the photo-mask including a plurality of circular hole patterns(206).