METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE ON SUBSTRATE, METHOD FOR FRACTURING OR MASK DATA PREPARATION FOR CHARGED PARTICLE BEAM LITHOGRAPHY, METHOD AND SYSTEM FOR FORMING A PLURALITY OF CIRCULAR PATTERNS ON SURFACE, AND SYSTEM FOR FRACTURING OR MASK DATA PREPARATION TO BE USED IN CHARGED PARTICLE BEAM LITHOGRAPHY

摘要

PPROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device using a photomask and optical lithography. PSOLUTION: Circular patterns on a semiconductor wafer are formed by using circular patterns on the photomask manufactured using a charged particle beam writer. In one embodiment, circular patterns of various sizes are formed on the photomask using a single character projection (CP) character, by varying the charged particle beam dosage. The method for fracturing the circular patterns using circular CP characters by the various dosages or using VSB shots and the method for forming the circular patterns on a surface are disclosed as well, and the union of the plurality of VSB shots is different from a set of desired patterns. The method for preparing glyphs is disclosed as well, and dosage maps generated from one or more charged particle beam shots are pre-calculated. PCOPYRIGHT: (C)2010,JPO&INPIT