Tungsten diaza butadiene molecules , their use in the deposition of the synthesis and the tungsten -containing layer

摘要

Tungsten Zia The butadiene molecule , I disclose their use in the deposition of the production method and the tungsten -containing film . Molecules of disclosure , the expression W (DAD) ₃ Have ( in the formula , DAD is 1,4 Jiazabuta -1,3- diene ligand and its reduced derivatives ) . DAD ligand directly coordinated to tungsten via the N atom . The molecules of the disclosure can be used for the deposition of the tungsten film , a tungsten nitride film, a tungsten carbide nitride film or a tungsten oxide film or any other tungsten-containing layer . Tungsten-containing layer is heat and / or plasma assisted CVD, ALD, may be deposited using the molecules disclosed in pulsed CVD or any other type of deposition process. [ Selection Figure ] None