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TUNGSTEN DIAZABUTADIENE MOLECULES, THEIR SYNTHESIS, AND THEIR USE FOR TUNGSTEN CONTAINING FILM DEPOSITIONS
TUNGSTEN DIAZABUTADIENE MOLECULES, THEIR SYNTHESIS, AND THEIR USE FOR TUNGSTEN CONTAINING FILM DEPOSITIONS
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机译:钨二氮杂丁二烯分子,它们的合成及其在含钨薄膜沉积中的用途
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摘要
Disclosed are tungsten diazabutadiene molecules, their method of manufacture, and their use in the deposition of tungsten-containing films. The disclosed molecules have the formula W(DAD)3, wherein DAD is a 1,4- diazabuta-1,3-diene Isgand and its reduced derivatives. The DAD !igand is directly coordinated to tungsten through the N atoms. The disclosed molecules may be used to deposit tungsten, tungsten-nitride, tungsten- carbonitride, or tungsten oxide films, or any other tungsten-containing films. The tungsten-containing films may be deposited using the disclosed molecules in thermal and/or plasma-enhanced CVD, ALD, pulse CVD or any other type of depositions methods.
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