fullerene derivative and a method of manufacturing the same, and fullerene derivative composition, the fullerene derivative solution and fullerene derivative film

摘要

PROBLEM TO BE SOLVED: To provide a fullerene derivative excellent in etching resistance and suitable for forming a carbon film with high hardness.;SOLUTION: The fullerene derivative is represented by formula (I). In formula (I), the circle represents a fullerene skeleton; R¹ represents a group represented by formula (II); m represents an integer of 1-20; R² represents a hydrogen atom, a hydroxyl group, or a 1-30C organic group; and n represents an integer of 0-20. In formula (II), A represents an arylene group which may have a substitute; B represents a 1-20C bivalent chain hydrocarbon linking group; and R³ represents a hydrogen atom, an alkyl group or aryl group which may have a substitute, or a heterocyclic hydrocarbon group which may have a substitute.;COPYRIGHT: (C)2013,JPO&INPIT