首页> 外国专利> Deposition of an intended dose distribution in a cyclically moved target area

Deposition of an intended dose distribution in a cyclically moved target area

机译:在周期性移动的目标区域中沉积预期的剂量分布

摘要

The invention concerns a process for the deposition of an intended dose distribution in a cyclically moved target region moving cyclically (102) by means of multiple irradiations with a beam (105) approaching matrix points of a target matrix in at least two scannings, wherein in each of the scannings, matrix points are approached sequentially. It is characterized through the steps: establishing the maximal tolerance level for local deviation from the intended dose distribution, de-synchronizing the sequence of the irradiation and the cyclical motion of the target region (102), and partitioning the irradiation of the target region (102) in a sufficient number of scannings such that local deviations from the intended dose distribution correspond at most to the maximal tolerance level of deviation from the intended dose distribution. Furthermore, the invention also concerns an irradiation apparatus for executing a process of this type and a process for determining the control parameters for said irradiation apparatus.
机译:本发明涉及一种方法,该方法通过以接近(B> 105 )的光束多次照射在循环移动的目标区域( 102 )中沉积预期的剂量分布在至少两次扫描中目标矩阵的矩阵点,其中在每个扫描中,顺序地接近矩阵点。它的特征在于以下步骤:建立与预期剂量分布的局部偏差的最大公差水平,使照射顺序与目标区域( 102 )的循环运动不同步,并进行分区以足够的扫描次数对目标区域( 102 )进行辐照,以使与预期剂量分布的局部偏差最多对应于与预期剂量分布的偏差的最大容许水平。此外,本发明还涉及一种用于执行这种过程的辐照设备以及一种用于确定所述辐照设备的控制参数的过程。

著录项

  • 公开/公告号US9044599B2

    专利类型

  • 公开/公告日2015-06-02

    原文格式PDF

  • 申请/专利权人 CHRISTOPH BERT;EIKE RIETZEL;

    申请/专利号US20090996700

  • 发明设计人 CHRISTOPH BERT;EIKE RIETZEL;

    申请日2009-06-08

  • 分类号A61N5/01;A61N5/10;

  • 国家 US

  • 入库时间 2022-08-21 15:18:50

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