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Ultraviolet light emitting diode array light source for photolithography and method

机译:用于光刻的紫外线发光二极管阵列光源和方法

摘要

A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.
机译:光源包括多个紫外(UV)发光二极管(LED)和耦合到多个UV LED的LED相移控制器,该LED相移控制器适于控制多个UV LED中的每个UV LED的相移。多个UV LED形成UV LED阵列。紫外线光刻系统可以包括如上所述的光源。该系统可以进一步包括在光源的光路上的反射镜组件,该反射镜组件具有带有干涉涂层的偏振镜。一种方法,提供了一种用于紫外线光刻系统的光源,该光源包括提供发射紫外线的多个紫外线发光二极管的元件以及利用耦合到每个紫外线发光二极管的LED相移控制器来控制多个紫外线发光二极管的相移的元件。多个UV LED中的一个或多个UV LED阵列。

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