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Methods for n-type doping of graphene, and n-type-doped graphene compositions
Methods for n-type doping of graphene, and n-type-doped graphene compositions
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机译:石墨烯的n型掺杂的方法以及n型掺杂的石墨烯组合物
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摘要
The present invention provides practical methods for n-type doping of graphene, either during graphene synthesis or following the formation of graphene. Some variations provide a method of n-type doping of graphene, comprising introducing a phosphorus-containing dopant fluid to a surface of graphene, under effective conditions to dope the graphene with phosphorus atoms or with phosphorus-containing molecules or fragments. It has been found that substitutional doping with phosphine can effectively modulate the electrical properties of graphene, such as graphene supported on Si or SiC substrates. Graphene sheet resistances well below 200 ohm/sq, and sheet carrier concentrations above 5×1013 cm−2, have been observed experimentally for n-doped graphene produced by the disclosed methods. This invention provides n-doped graphene for various electronic-device applications.
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机译:本发明提供了在石墨烯合成期间或在石墨烯形成之后用于n型掺杂石墨烯的实用方法。一些变体提供了n型掺杂石墨烯的方法,该方法包括在有效条件下将含磷掺杂剂流体引入石墨烯表面,以用磷原子或含磷分子或片段掺杂石墨烯。已经发现,用磷化氢进行的替代掺杂可以有效地调节石墨烯的电性能,例如负载在Si或SiC衬底上的石墨烯。对于通过本发明公开的方法制备的n掺杂石墨烯,已经通过实验观察到石墨烯薄层电阻远低于200 ohm / sq,并且薄片载流子浓度高于5×10 13 Sup> cm -2 Sup>。方法。本发明提供了用于各种电子设备应用的n掺杂石墨烯。
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