首页> 外国专利> Photodiode having a p-n junction with varying expansion of the space charge zone due to application of a variable voltage

Photodiode having a p-n junction with varying expansion of the space charge zone due to application of a variable voltage

机译:光电二极管具有p-n结,由于施加可变电压,其空间电荷区的扩展范围不同

摘要

A photodiode comprises a semiconductor material having a p-n junction, the p-n junction being located between a first doping region of a first doping type and a second doping region of a second doping type, the second doping region comprising a highly doped layer and a lightly doped layer. A photodiode further comprises a voltage source being capable to apply a variable voltage between the first doping region and the lightly doped layer of the second doping region in order to vary the expansion of a space charge zone of the p-n junction.
机译:光电二极管包括具有pn结的半导体材料,该pn结位于第一掺杂类型的第一掺杂区域和第二掺杂类型的第二掺杂区域之间,第二掺杂区域包括高掺杂层和轻掺杂层层。光电二极管还包括电压源,该电压源能够在第一掺杂区和第二掺杂区的轻掺杂层之间施加可变电压,以改变p-n结的空间电荷区的扩展。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号