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Pitch quartering to create pitch halved trenches and pitch halved air gaps
Pitch quartering to create pitch halved trenches and pitch halved air gaps
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机译:间距四分之一以创建间距减半的沟槽和间距减半的气隙
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摘要
A silicon structure is fabricated determining a pattern for wire trenches and air gaps. The wire trenches are created, and certain trenches are used as air gaps. The remaining wire trenches are used for metallization of inter connecting wires.
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