ADJUSTMENT AND DESIGN METHOD OF LIGHTING SYSTEM OF EXTREME ULTRAVIOLET LITHOGRAPHY MACHINE WITH MULTIPLE MATCHING OBJECTIVE LENSES

摘要

An adjustment and design method of a lighting system of an extreme ultraviolet lithography machine with multiple matching objective lenses. Lighting systems to which the method is applied comprise a light source, a collection lens, a field-of-view compound eye, a diaphragm compound eye, and a relay lens group. The method comprises the following steps: before a projection objective lens of an extreme ultraviolet lithography machine is replaced, calculating aperture angles of emergent light of a relay lens A on a meridian surface and a sagittal surface by means of ray tracing; after the projection objective lens of the extreme ultraviolet lithography machine is replaced, taking out a central point of a pupil surface as an object point for ray tracing; adjusting angles of inclination and positions of the relay lens A and a relay lens B, and adjusting angles of inclination of central compound eye elements of a diaphragm compound eye and a field-of-view compound eye, till an image surface of a current lighting system approximates an arc image surface corresponding to the projection objective lens. In this way, by adjusting a lighting system, a lighting system matching the projection objective lens system is obtained, which greatly reduces the design costs of a projection lithography machine.