首页> 外国专利> THERMOSETTING RESIN COMPOSITION FOR FORMING CURED FILM, NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION, POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING SAME, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE

THERMOSETTING RESIN COMPOSITION FOR FORMING CURED FILM, NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION, POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING SAME, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE

机译:用于形成固化膜的热固性树脂组合物,负辐射敏感的树脂组合物,正辐射敏感的树脂组合物,中空膜,相同的形成方法,半导体器件和显示装置

摘要

According to the present invention, a cured film, which has excellent hardness of the surface and has descent common properties such as sensitivity, development tightness, chemical resistance, heat resistance, transmittance, and a relative dielectric constant, can be formed. The present invention aims to provide: a thermosetting resin composition for forming a cured film having excellent storage stability; a negative radiation-sensitive resin composition; and a positive radiation-sensitive resin composition. The resin composition for forming a cured film includes a copolymer. The copolymer includes: a structure unit (I) including at least one selected from the group consisting of a group represented by chemical formula (1) and a group represented by chemical formula (2); and a structure unit including a cross-linking group (a1) represented by chemical formula (2).;COPYRIGHT KIPO 2015
机译:根据本发明,可以形成表面硬度优异,具有下降敏感性,显影密闭性,耐化学药品性,耐热性,透射率,相对介电常数等下降特性的固化膜。本发明的目的在于提供一种保存稳定性优异的固化膜形成用热固性树脂组合物。负射线敏感性树脂组合物;正放射线敏感性树脂组合物。用于形成固化膜的树脂组合物包括共聚物。该共聚物包括:结构单元(I),其包括选自化学式(1)表示的基团和化学式(2)表示的基团中的至少一种。 COPYRIGHT KIPO 2015;以及包含化学式(2)表示的交联基团(a1)的结构单元。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号