首页> 外国专利> METHOD FOR FABRICATING SPUTTERING TARGET, SPUTTERING TARGET FABRICATED THEREBY, AND METHOD FOR FABRICATING ORGANIC LIGHT EMITTING DISPLAY APPARATUS USING SPUTTERING TARGET

METHOD FOR FABRICATING SPUTTERING TARGET, SPUTTERING TARGET FABRICATED THEREBY, AND METHOD FOR FABRICATING ORGANIC LIGHT EMITTING DISPLAY APPARATUS USING SPUTTERING TARGET

机译:制造散射目标的方法,由此制造的散射目标以及利用散射目标制造有机发光显示装置的方法

摘要

The present invention relates to a method for fabricating a sputtering target which can conduct film formation on an insulating inorganic material in a sputtering method; a sputtering target fabricated thereby; and a method for fabricating an organic light emitting display apparatus using the sputtering target. According to an embodiment of the present invention, the method for fabricating a sputtering target comprises the steps of: preparing a first powdered material including at least tin oxide; fabricating a mixture by mixing the first powdered material and a second powdered material containing carbon; and fabricating a sputtering target by compressing and sintering the mixture while the mixture is in a reducing process.;COPYRIGHT KIPO 2015
机译:溅射靶的制造方法技术领域本发明涉及一种能够通过溅射法在绝缘性无机材料上成膜的溅射靶的制造方法。由此制造的溅射靶;以及使用溅射靶制造有机发光显示装置的方法。根据本发明的一个实施例,一种用于制造溅射靶的方法包括以下步骤:制备至少包括氧化锡的第一粉末材料;以及将第一粉末材料制成至少包括氧化锡的第一粉末材料。通过混合第一碳粉和第二碳粉来制造混合物。并在还原过程中压缩和烧结混合物以制备溅射靶。; COPYRIGHT KIPO 2015

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