首页> 外国专利> ULTRA-THIN GOLD-PALLADIUM ALLOY PLATING SOLUTION FOR FORMING PPF PLATING LAYER OF SEMICONDUCTOR LEAD FRAME

ULTRA-THIN GOLD-PALLADIUM ALLOY PLATING SOLUTION FOR FORMING PPF PLATING LAYER OF SEMICONDUCTOR LEAD FRAME

机译:用于形成半导体铅骨架的PPF镀层的超薄金钯合金镀层解决方案

摘要

According to the present invention, disclosed is an ultra-thin gold-palladium alloy plating solution for forming the PPF plating layer of a semiconductor lead frame. The ultra-thin gold-palladium alloy plating solution for forming the PPF plating layer of a semiconductor lead frame is a plating solution which forms a plating layer on the surface of a lead frame during a semiconductor manufacturing process. The plating solution includes at least one selected from a group comprising potassium gold (I) cyanide, potassium gold (III) cyanide, gold (III) chloride hydrate, and sodium gold sulfite; and at least one selected from a group comprising dichloro tetraammonium palladium, palladium chloride anhydrous, palladium (II) acetate, palladium (II) nitrate, and palladium (II) cyanide. Accordingly, the manufacturing efficiency of a semiconductor process can be increased by securing adhesion, corrosion resistance, and wirebondability properties.;COPYRIGHT KIPO 2015
机译:根据本发明,公开了一种用于形成半导体引线框架的PPF镀层的超薄金钯合金镀覆溶液。用于形成半导体引线框架的PPF镀层的超薄金-钯合金镀覆溶液是在半导体制造过程中在引线框架的表面上形成镀覆层的镀覆溶液。镀液包含选自氰化钾金(I),氰化钾金(III),氯化金(III)水合物和亚硫酸钠金中的至少一种。选自二氯四铵钯,无水氯化钯,乙酸钯(II),硝酸钯(II)和氰化钯(II)中的至少一种。因此,可以通过确保附着力,耐腐蚀性和引线键合性来提高半导体工艺的制造效率。; COPYRIGHT KIPO 2015

著录项

  • 公开/公告号KR20150014685A

    专利类型

  • 公开/公告日2015-02-09

    原文格式PDF

  • 申请/专利权人 KIEL KI HWAN;

    申请/专利号KR20130090212

  • 发明设计人 KIEL KI HWANKR;

    申请日2013-07-30

  • 分类号C25D3/56;C25D7/12;

  • 国家 KR

  • 入库时间 2022-08-21 15:00:44

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