LITHOGRAPHY DEVICES TO FABRICATE ULTRA LOW DENSITY THREE-DIMENSIONAL THIN-FILM STRUCTURES

摘要

The present invention relates to a lithography device for manufacturing ultra-low density three-dimensional thin film structures. The device comprises: a plate-type base; a light radiating unit which is placed on the upper portion of the base; a support unit where the light radiating unit is connected to the base; and a receiver unit which is mounted on the upper surface of the base and is equipped with a photosensitive resin storage container and thus can promote efficiency and stability in the production of three-dimensional thin film structures by simply and accurately carrying out a lithography process.