首页> 外国专利> 3 Lithography Devices to Fabricate Ultra Low Density Three-Dimensional Thin-Film Structures

3 Lithography Devices to Fabricate Ultra Low Density Three-Dimensional Thin-Film Structures

机译:3种用于制造超低密度三维薄膜结构的光刻设备

摘要

The present invention relates to a lithographic apparatus for manufacturing an extremely low density three-dimensional thin film structure. The apparatus comprises: a plate-shaped base; A light irradiating unit located above the base; A support unit connecting the light irradiation unit to the base; And a receiver unit mounted on the upper surface of the base, the receiver unit being mounted with a photosensitive resin storage container. By performing the lithography process easily and precisely, manufacturing efficiency and stability of the 3D thin film structure can be improved.
机译:本发明涉及一种用于制造极低密度的三维薄膜结构的光刻设备。该设备包括:板状基座;光照射单元位于底座上方;支撑单元,将光照射单元连接至基座;接收器单元安装在基座的上表面,该接收器单元安装有光敏树脂存储容器。通过容易且精确地执行光刻工艺,可以提高3D薄膜结构的制造效率和稳定性。

著录项

  • 公开/公告号KR101576942B1

    专利类型

  • 公开/公告日2015-12-22

    原文格式PDF

  • 申请/专利权人 전남대학교산학협력단;

    申请/专利号KR20140032162

  • 发明设计人 강기주;한승철;이정우;

    申请日2014-03-19

  • 分类号G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 14:15:25

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