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3 Lithography Devices to Fabricate Ultra Low Density Three-Dimensional Thin-Film Structures
3 Lithography Devices to Fabricate Ultra Low Density Three-Dimensional Thin-Film Structures
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机译:3种用于制造超低密度三维薄膜结构的光刻设备
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摘要
The present invention relates to a lithographic apparatus for manufacturing an extremely low density three-dimensional thin film structure. The apparatus comprises: a plate-shaped base; A light irradiating unit located above the base; A support unit connecting the light irradiation unit to the base; And a receiver unit mounted on the upper surface of the base, the receiver unit being mounted with a photosensitive resin storage container. By performing the lithography process easily and precisely, manufacturing efficiency and stability of the 3D thin film structure can be improved.
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