首页> 外国专利> GRAPHENE MANUFACTURING METHOD, GRAPHENE MANUFACTURING METHOD ETCHING GRAPHENE ATOMIC LAYER, GRAPHENE BENDING TRANSISTOR HAVING WAFER COMBINATION METHOD, AND GRAPHENE BENDING TRANSISTOR

GRAPHENE MANUFACTURING METHOD, GRAPHENE MANUFACTURING METHOD ETCHING GRAPHENE ATOMIC LAYER, GRAPHENE BENDING TRANSISTOR HAVING WAFER COMBINATION METHOD, AND GRAPHENE BENDING TRANSISTOR

机译:石墨烯制造方法,石墨烯制造方法蚀刻石墨烯原子层,具有晶片结合方法的石墨烯弯曲晶体管和石墨烯弯曲晶体管

摘要

Provided in the present invention is a method for manufacturing low temperature direct growth graphene directly growing on a substrate at low temperature. Also, provided in the present invention is a method for manufacturing of single layer or multilayer graphene. And, provided in the present invention is multilayer graphene directly growing on a substrate. Provided in the present invention are single layer graphene uniformly distributed on the upper part of a carbon dissolved layer, and a method for manufacturing single layer or multilayer graphene by radiating an energy source on multilayer graphene after growing the multilayer graphene.;COPYRIGHT KIPO 2016
机译:本发明提供了一种用于在低温下直接生长在基板上的低温直接生长石墨烯的制造方法。另外,本发明提供了一种用于制造单层或多层石墨烯的方法。并且,本发明提供了直接在基板上生长的多层石墨烯。本发明提供了均匀分布在碳溶解层上部的单层石墨烯,以及在多层石墨烯生长后通过在多层石墨烯上辐射能量来制造单层或多层石墨烯的方法。COPYRIGHTKIPO 2016

著录项

  • 公开/公告号KR20150121590A

    专利类型

  • 公开/公告日2015-10-29

    原文格式PDF

  • 申请/专利权人 LEE YOUN TEK;

    申请/专利号KR20140047673

  • 发明设计人 LEE YOUN TEKKR;

    申请日2014-04-21

  • 分类号C01B31/04;

  • 国家 KR

  • 入库时间 2022-08-21 14:58:57

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