HYBRID RF CAPACITIVELY AND INDUCTIVELY COUPLED PLASMA SOURCE USING MULTIFREQUENCY RF POWERS AND METHODS OF USE THEREOF

摘要

device to limit the induced capacitive coupled RF plasma formed in the plasma processing apparatus. The plasma processing apparatus supports the upper electrode and the substrate comprises a lower electrode for generating a plasma between the upper electrode and the substrate. Device includes a plurality of coil units jakchak onto a support ring surrounding the dielectric and the dielectric support ring concentrically to the upper electrode. Each of the plurality of coil units includes at least one coil wound around the ferromagnetic core and the ferromagnetic core of each of the position along the radial direction of the dielectric support ring. Upon receiving the plurality of coil units are RF power from the RF power source, and generates electric and magnetic fields to reduce the number of charged particles in the plasma to diffuse away from the plasma. ; plasma processing apparatus, a coil unit, a dielectric support ring, the ferromagnetic core