Comparison of plasma sources for surface treatment applications: Radiofrequency inductively coupled and surface-wave microwave plasma sources

摘要

Summary form only given. This work was conducted within the framework of PAUD (Plasma Airborne molecular contamination Ultra Desorption), a collaborative program funded by OSEO and certified by French global competitive clusters Minalogic and Trimatec. The main object of interest is to develop new technology bricks for next generation molecular decontamination systems. As part of our research effort in evaluating the potential of plasma treatment as a solution, the performance of different plasma sources was evaluated.Here, we will show the electronic density and temperature radial profiles, as well as plasma emission at different locations obtained with both plasma sources. The results will be presented as a function of sources injected power (up to 2 kW), argon gas flow (10 ~ 300 sccm) and pressure (5 10-3 ~5 10-1 mbar).