IN-CHAMBER MEMBER TEMPERATURE CONTROL METHOD IN-CHAMBER MEMBER SUBSTRATE MOUNTING TABLE AND PLASMA PROCESSING APPARATUS INCLUDING SAME

摘要

There is provided a method capable of controlling the temperature of various members used in the plasma treatment to an optimum temperature from the start of the plasma treatment.;A method of controlling a temperature of an in-chamber member used in a plasma processing apparatus for plasma-processing a substrate to be processed, the method comprising: providing a plurality of feeders in the chamber; heating the substrate by supplying electric power through the feeder; The resistance value or the non-resistance of the member in the chamber is measured, and the electric power is controlled based on the resistance value or the temperature of the in-chamber member assumed from the specific resistance.