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- MEMORY DEVICE COMPRISING A STRAINED SEMICONDUCTOR DOUBLE-HETEROSTRUCTURE AND QUANTUM DOTS

机译:-包含受约束的半导体双异质结构和量子点的存储器

摘要

An embodiment of the present invention relates to a memory comprising a modified double-hetero structure 110 having an inner semiconductor layer 115 sandwiched between two outer semiconductor layers 120 and 125, wherein the lattice constant of the inner semiconductor layer The resulting lattice strain in the double-hetero structure induces the formation of at least one quantum dot within the inner semiconductor layer, the at least one quantum dot having charge carriers in it And at least one of the quantum dots has an emission barrier Eb of at least 1.15 eV due to the lattice strain and provides an energy state density of at least three energy states per 1000 nm 3 , At least three energy states 186 are located within an energy band (DeltaWb) of 50 meV or less.
机译:本发明的实施例涉及一种存储器,其包括改进的双异质结构110,该结构具有夹在两个外部半导体层120和125之间的内部半导体层115,其中内部半导体层的晶格常数-异质结构诱导在内部半导体层内形成至少一个量子点,该至少一个量子点中具有电荷载流子,并且至少一个量子点由于具有至少1.15eV的发射势垒Eb。晶格应变并提供每1000 nm 3 至少三个能态的能态密度。至少三个能态186位于50 meV或更小的能带(DeltaWb)内。

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