Plas moni che high speed before directions for improving the capability of microelectronic devices

摘要

A photonic device (100) which comprises the following:a dielectric layer (104), which is a top surface and a lower surface, in which the lower surface of the dielectric layer on the upper surface of a substrate (102) is positioned; anda planar nano wire network (106) of the workpiece, the at least a part of the upper surface of the dielectric layer and to the effect is configured to convert the incident electromagnetic radiation in the surface plasmons, which penetrate the dielectric layer and into at least a part of the substrate penetration,the planar nano wire network (106) of the workpiece, a number of radial nanowires (201 – 206), wherein each nanowire - radially beam starting from a center region of the planar nano wire network according to the outside, and a number of transversely extending nanowires (207 – 212), wherein each of the nanowire - transverse beam two adjacent nanowire - radially bar connects to one another has.