Charged-particle multi-jet writing device and charged-particle multi-jet writing method

摘要

A charged particle multi-jet writing apparatus comprising a charge amount distribution calculating unit for calculating a charge amount distribution whose charge amount is charged by perpendicular incidence of a representative beam of a plurality of beams in a write area of a target object, a position correcting unit for calculating a corrected position of an irradiation position of each beam by the charge amount distribution, wherein a positional deviation amount depending on the irradiation position of each of the plurality of beams comprising a charge amount based positional deviation amount of irradiation position has been corrected, and a writing unit for writing a pattern on the target object by controlling an irradiation amount of each beam in such a manner in that a formation position of a radiation pattern of each beam of the plurality of beams is a correspondingly corrected position.