Polishing felts mecano - chemical and ed ris tho detection limit point in the polymer which is stable at the application and advantages of the polishing associated

摘要

The present invention relates to a felt of chemical mechanical polishing - comprising: a layer of polishing having a polished surface; and a window of the detection of the limit point of a polymer which is stable to light, comprising: a polyurethane obtained by reacting an aromatic polyamine containing amine groups, and a polyol prepolymer containing isocyanate containing - nco groups which have not reacted, and constituting a light stabilising comprising at least one uv absorber or a hindered amine light stabilizer; where the aromatic polyamine and the polyol prepolymer containing isocyanate are supplied in a stoichiometric ratio of the amine group to group - nco which has not reacted 95%, in which the detection window of the limit point of a polymer which is stable to light which has a deformation in the course of time ≤ 0,02% when it is measured with an axial traction load is constant for 1 kpa to a constant temperature of 60°C. to 100 min and an optical transmission with a double passage ≥ 15% at a wavelength of 380 nm for a thickness of the window of 1,3 mm; and, in which the polishing surface is adapted to be polished substrate chosen from a magnetic substrate, an optical substrate and a semi conducting -. The present invention also relates to a process for polishing of a substrate (preferably a semi conducting -) using the felt of chemical mechanical polishing - supplied.