首页> 外国专利> AVALANCHE PHOTODIODE SEMICONDUCTOR STRUCTURE HAVING A HIGH SIGNAL-TO-NOISE RATIO AND METHOD FOR MANUFACTURING SUCH A PHOTODIODE

AVALANCHE PHOTODIODE SEMICONDUCTOR STRUCTURE HAVING A HIGH SIGNAL-TO-NOISE RATIO AND METHOD FOR MANUFACTURING SUCH A PHOTODIODE

机译:具有高信噪比的雪崩光电二极管半导体结构及制造这种光电二极管的方法

摘要

The invention relates to an avalanche photodiode semiconductor structure (1) for receiving electromagnetic radiation in a given wavelength range and comprising a first semiconductor area (210) suitable for absorbing the electromagnetic radiation, a second area (310) suitable for providing a multiplication of carriers, and a third semiconductor area (410) in contact with the second semiconductor area (310). The second area (310) comprises at least two subparts (321, 322), the second subpart (322) being suitable for presenting a mean carrier multiplication rate that is greater than that of the first subpart (321). The invention also relates to a method for manufacturing such a structure (1).
机译:本发明涉及一种雪崩光电二极管半导体结构(1),用于接收给定波长范围内的电磁辐射,并包括适合于吸收电磁辐射的第一半导体区域(210),适合于提供载流子倍增的第二区域(310)。以及与第二半导体区域(310)接触的第三半导体区域(410)。第二区域(310)包括至少两个子部分(321、322),第二子部分(322)适合于呈现大于第一子部分(321)的平均载波倍增率。本发明还涉及一种用于制造这种结构(1)的方法。

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