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Laser irradiation apparatus, laser irradiation method, beam homogenizer, semiconductor device, and method of manufacturing the semiconductor device

机译:激光照射装置,激光照射方法,光束均化器,半导体装置及其制造方法

摘要

A beam homogenizer configured for converting an originally rectangular beam into a linear shape having a two stage energy distribution in a width direction comprising a first beam width (w1) having a first energy density (E1) and a second beam width (w2) having a second energy density (E2), the beam homogenizer comprising: an optical lens (501) for dividing an incident laser beam in width direction into parts and enlarging the parts; and an optical system (204, 208) for synthesizing said parts of said laser beam divided by said optical lens in a width direction, whereby the synthesized laser beam has a two stage energy distribution in the width direction, wherein said optical lens (501) includes a plano-convex lens (602, 603, 604, 605) as a cylindrical lens and a plano-convex lens cut into halves (601, 606) perpendicular to its plane surface as a semi-cylindrical lens.
机译:光束均化器,其被配置为将原始矩形光束转换成在宽度方向上具有两级能量分布的线性形状,该线性形状包括具有第一能量密度(E1)的第一光束宽度(w1)和具有第二能量密度的第二光束宽度(w2)。第二能量密度(E2),该光束均化器包括:光学透镜(501),用于将入射激光束在宽度方向上分成多个部分并放大该部分;以及光学系统(204、208),其用于合成在宽度方向上被所述光学透镜分割的所述激光束的所述部分,从而合成的激光束在宽度方向上具有两级能量分布,其中,所述光学透镜(501)包括作为圆柱透镜的平凸透镜(602、603、604、605)和作为半圆柱透镜的被切成垂直于其平面的两半(601、606)的平凸透镜。

著录项

  • 公开/公告号EP1003207B1

    专利类型

  • 公开/公告日2016-09-07

    原文格式PDF

  • 申请/专利权人 SEMICONDUCTOR ENERGY LABORATORY CO. LTD.;

    申请/专利号EP19990119559

  • 发明设计人 TANAKA KOICHIRO;

    申请日1999-10-01

  • 分类号H01L21/20;G02B26/10;G02B27/10;H01L21/268;G02B27/09;

  • 国家 EP

  • 入库时间 2022-08-21 14:52:55

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