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BOTTOM GATE BOTTOM CONTACT THIN FILM TRANSISTOR, METHOD OF MANUFACTURING BOTTOM GATE BOTTOM CONTACT THIN FILM TRANSISTOR, AND IMAGE DISPLAY DEVICE
BOTTOM GATE BOTTOM CONTACT THIN FILM TRANSISTOR, METHOD OF MANUFACTURING BOTTOM GATE BOTTOM CONTACT THIN FILM TRANSISTOR, AND IMAGE DISPLAY DEVICE
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机译:底部门底部接触薄膜晶体管,制造底部门底部接触薄膜晶体管和图像显示装置
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摘要
PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin film transistor where a drain electrode is not covered by mistake, when covering the source wiring with a protective layer, and to provide a thin film transistor manufactured by that method, and an image display device.SOLUTION: In a bottom gate, bottom contact thin film transistor, a protective layer 8 for protecting a semiconductor layer is formed so as to cover the gate electrodes 2 formed on a substrate 1, i.e., a support, at regular intervals in stripe, stripe semiconductor layers 7 formed in parallel at regular intervals perpendicularly to the gate electrode, while connecting the source electrode 4 and drain electrode 5 formed on a gate insulator layer 3 covering the gate electrode and the substrate, and source wiring 6 connecting the semiconductor layer thereof and the source electrode and the source electrode arranged in parallel with the semiconductor layer thereof in parallel.SELECTED DRAWING: Figure 1
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