PROBLEM TO BE SOLVED: To provide a vacuum arc vapor deposition method and a vacuum arc vapor deposition apparatus, by means of which a good quality thin film can be deposited on a substrate surface by surely preventing the generation of macro particles during an arc discharge, when a DLC (Diamond-Like Carbon) film is deposited using a carbon material as the material of a cathode.;SOLUTION: The vacuum arc vapor deposition method is provided in which a carbon material is deposited on a substrate surface through vapor deposition by evaporating a cathode formed with the carbon material. A cathode is used in which a pedestal part and at least one projection projecting from the pedestal part are provided and the projection is formed with glassy carbon or laminated carbon. A discharge voltage at the cathode is measured during an arc discharge, and the measured discharge voltage and a preset threshold value are compared to determine whether or not the position of the arc discharge at the cathode is present in the projection. When it is determined that the position of the arc discharge is not present in the projection, the arc discharge is temporarily stopped, and then resumed.;SELECTED DRAWING: Figure 3;COPYRIGHT: (C)2016,JPO&INPIT
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