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Β-Ga2O3-based single crystal substrate for growth of Ga-containing oxide layer
Β-Ga2O3-based single crystal substrate for growth of Ga-containing oxide layer
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机译:基于growth-Ga2O3的单晶衬底,用于生长含Ga的氧化物层
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摘要
Provided are: a crystal laminate structure, in which crystals can be epitaxially grown on a ²-Ga 2 O 3 -based substrate with high efficiency to produce a high-quality ²-Ga 2 O 3 -based crystal film on the substrate; and a method for producing the crystal laminate structure. Provided is a crystal laminate structure (2) comprising: a ²-Ga 2 O 3 -based substrate (1), of which the major face (10) is a face that is rotated by 50 to 90° inclusive with respect to face (100); and a ²-Ga 2 O 3 -based crystal film (2) which is formed by the epitaxial crystal growth on the major face (10) of the ²-Ga 2 O 3 -based substrate (1).
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机译:提供:一种晶体层压结构,其中可以在²-Ga2 O 3基衬底上高效地外延生长晶体,从而在衬底上生产高质量的²-Ga2 O 3基晶体膜。以及用于制造晶体层压结构的方法。提供了一种晶体层压结构(2),其包括:2 -Ga 2 O 3基衬底(1),其中主面(10)是相对于面(包括面)旋转50至90°(包括端值)的面。 100);通过在2 -Ga 2 O 3基衬底(1)的主表面(10)上外延晶体生长形成的2 -Ga 2 O 3基晶体膜(2)。
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