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The method of reducing metal content of the device layer of the Soi structure, and soi structure produced by such a method
The method of reducing metal content of the device layer of the Soi structure, and soi structure produced by such a method
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机译:降低Soi结构的器件层中金属含量的方法以及通过这种方法生产的soi结构
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摘要
Method for producing a silicon-on-insulator structure having a metal content reduced in the device layer is disclosed. It is also disclosed silicon-on-insulator structure having a metal content reduced.
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