首页> 外国专利> Volatile dihydropyrazinyl and dihydropyrazine metal complexes

Volatile dihydropyrazinyl and dihydropyrazine metal complexes

机译:挥发性二氢吡嗪基和二氢吡嗪金属配合物

摘要

A composition comprising dihydropyrazinyl anions that can be coordinated as 6 electron ligands to a broad range of different metals to yield volatile metal complexes for ALD and CVD depositions are described herein. Also described herein are undeprotonated dihydropyrazines that can coordinate to metals as stabilizing neutral ligands. In one embodiment, the composition is used for the direct liquid injection delivery of the metal dihydropyrazinyl complex precursor to the chamber of an ALD or CVD chamber for the deposition of metal-containing thin films such as, for example, ruthenium or cobalt metal films.
机译:本文描述了包含二氢吡嗪基阴离子的组合物,其可以作为6个电子配体与多种不同的金属配位以产生用于ALD和CVD沉积的挥发性金属络合物。本文还描述了可以与金属作为稳定的中性配体配合的未去质子化的二氢吡嗪。在一个实施方案中,该组合物用于将金属二氢吡嗪基络合物前体直接液体注射递送至ALD或CVD室的室,以沉积含金属的薄膜,例如钌或钴金属膜。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号