首页> 外国专利> X-ray fluorescence analysis method of X-ray fluorescence analyzer and using the same calibration provided sample as well as that for X-ray fluorescence analysis

X-ray fluorescence analysis method of X-ray fluorescence analyzer and using the same calibration provided sample as well as that for X-ray fluorescence analysis

机译:X射线荧光分析仪的X射线荧光分析方法以及使用相同的校准方法提供的样品以及X射线荧光分析的样品

摘要

The subject of the invention provides a calibration sample and a fluorescence X-ray analytical device and method, provides a calibration sample for analyzing fluorescence X-ray of a liquid sample, can be used for a long time and can perform accurate difference calibration. A calibration sample of the invention is a solid calibration sample which can be used for calibrating and analyzing change of measurement X-ray intensity of object metal elements as time goes, wherein metal layers of object metal elements and light element layers with thickness of more than 1mm are overlapped; in the light element layers, at least one light element selected from the group of hydrogen, boron, carbon, nitrogen, oxygen and fluorine possesses a largest Moore number; in the metal layers, a surface of an opposite side relative to the light element layers is an analytical layer.
机译:本发明的主题提供了一种校准样品以及荧光X射线分析装置和方法,提供了一种用于分析液体样品的荧光X射线的校准样品,其可以长时间使用并且可以执行准确的差异校准。本发明的校准样品是固体校准样品,其可用于随着时间的流逝校准和分析目标金属元素的测量X射线强度的变化,其中目标金属元素的金属层和厚度大于10μm的轻元素层1mm重叠;在轻元素层中,选自氢,硼,碳,氮,氧和氟的组中的至少一种轻元素具有最大的摩尔数;在金属层中,相对于轻元素层的相反侧的表面是分析层。

著录项

  • 公开/公告号JP5938708B2

    专利类型

  • 公开/公告日2016-06-22

    原文格式PDF

  • 申请/专利权人 株式会社リガク;

    申请/专利号JP20110227624

  • 发明设计人 小林 寛;

    申请日2011-10-17

  • 分类号G01N23/223;

  • 国家 JP

  • 入库时间 2022-08-21 14:42:22

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