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Recycling method of developing processing waste liquid concentration method and developing processing waste liquid

机译:显影处理废液浓缩方法的再循环方法和显影处理废液

摘要

Infrared absorbing dye on a support, a polymerization initiator, and a polymerizable compound, a lithographic printing plate precursor having an image recording layer and the protective layer containing, after exposure, the anionic surfactant having a naphthalene skeleton and / or a nonionic surfactant containing 10 wt% 1 wt% having a naphthalene skeleton, an organic solvent content of the boiling point of 0.89 C. to 300 C. is not more than 2 wt%, pH is 6.0 to 9. obtaining a waste liquid arising in developing with a developer of 5, and the waste liquid amount of the development waste solution before the amount / concentration of the development waste solution after the concentration is 1 / 2-1 / 10 by volume developing processing waste liquid concentration methods, including step, the evaporated concentrated so.
机译:载体上的红外吸收染料,聚合引发剂和可聚合化合物,具有图像记录层和保护层的平版印刷版原版,其曝光后具有包含萘骨架的阴离子表面活性剂和/或包含10的非离子表面活性剂具有萘骨架的1重量%,沸点为0.89℃至300℃的有机溶剂含量不大于2重量%,pH为6.0至9。获得在用显影剂显影时产生的废液。 5,通过体积显影处理废液浓缩方法(包括步骤)将蒸发废液浓缩后的显影废液量/浓缩后的显影废液量/浓缩后的废液量为1 / 2-1 / 10 。

著录项

  • 公开/公告号JPWO2014002835A1

    专利类型

  • 公开/公告日2016-05-30

    原文格式PDF

  • 申请/专利权人 富士フイルム株式会社;

    申请/专利号JP20140522561

  • 发明设计人 割石 幸司;小林 史和;森 崇徳;

    申请日2013-06-18

  • 分类号G03F7/32;G03F7/00;G03F7/004;G03F7/11;C02F1/04;

  • 国家 JP

  • 入库时间 2022-08-21 14:39:56

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