SEMICONDUCTOR STRUCTURE HAVING LOGIC REGION AND ANALOG REGION

摘要

A method can include epitaxially growing epitaxial growth material within a logic region of a semiconductor structure. A method can include performing simultaneously with the growing epitaxial growth within an analog region of the semiconductor structure. A method can include performing epitaxial growth to form an epitaxial growth formation that defines an electrode of an analog device within an analog region of the semiconductor structure, wherein the performing includes using a first surface and a second surface as seed surfaces.