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RAMAN SCATTERING FROM SUBSURFACE REGIONS OF SEMICONDUCTORS.

机译:半导体表面以下区域的拉曼散射。

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摘要

Raman scattering as a technique for studying the chemical and electrical properties of semiconductors was explored in this thesis. It was used to study the variation of surface band bending with the chemistry of surface treatment and the resuts were compared with previous work using high vacuum techniques. The temperature dependence of the plasmon in n-type GaAs was measured and described by the statistical physics of carriers in semiconductors. Further work involved an analysis of surface chemical species known to be present during oxidation. Here, the dynamics of the growth of As crystals on the GaAs surface was determined and certain reaction barrier energies measured for this process.
机译:本文探索了拉曼散射技术作为研究半导体化学和电学性质的技术。它用于研究表面带弯曲随表面处理化学的变化,并将结果与​​使用高真空技术的先前工作进行比较。通过半导体中载流子的统计物理学来测量和描述n型GaAs中等离激元的温度依赖性。进一步的工作涉及分析已知在氧化过程中存在的表面化学物质。在此,确定了砷化镓晶体在砷化镓表面上的生长动力学,并为此过程测量了一定的反应势垒能。

著录项

  • 作者

    MARTIN, ROBERT ARTHUR.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 1986
  • 页码 137 p.
  • 总页数 137
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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